Notes

Moiré patterns

A wide rectangle of fine, nearly vertical black lines on warm paper. On the left only one set of lines is drawn, on the right only a second set at a slightly different angle. In the middle third, where both sets overlap, broad dark and light diagonal bands appear.
Diagram by JAEV: two identical sets of parallel lines, 5 px apart, the second turned by 3 degrees. Each set is seen alone at one side; the moiré bands appear only where they overlap. CC BY 4.0.

A moiré is a pattern of broad light and dark bands that appears when two fine, regular sets of lines lie on top of each other. Neither set contains the bands. They come from the way the two sets cross: where the lines fall on top of each other, more paper shows and the area looks light; where they fall between each other, they cover more paper and the area looks dark. The word comes from French moiré, a fabric, historically silk, with a rippled "watered" look.1

How wide the bands are

The bands are much wider than the lines that make them, and their width follows from two numbers. Take two identical sets of parallel lines with spacing p and turn one by a small angle α. The light bands are then

D = (p/2) / sin(α/2)

apart, which for small angles is close to p/α (with α in radians).1 Lines 5 px apart, turned by 3 degrees, give bands about 95 px apart, as in the drawing at the top of this page. The smaller the angle, the wider the bands.

That magnification is why moiré is used to measure. A grid printed on a material and compared with an undeformed grid shows strain in the material as bands. It is also why it is a nuisance: in printing, the dot screens of the different inks are set at chosen angles to avoid it; and patterned clothes can make it appear on television.1

Live sketch by JAEV: two identical sets of lines, the top one moving slowly. With straight lines it turns between about half a degree and six and a half degrees; with concentric circles it slides sideways. The bands move much faster and further than the lines themselves. Each drawing switches between the two and takes a new random spacing. Code CC BY 4.0.

On the plotter

A pen plotter makes moiré easily, because it draws many fine lines close together. When the textile designer Astrid Sampe asked IBM to help her draw a red cross by computer, the programmer Sten Kallin noticed that the pen of the IBM 1130's plotter sat a little loose in its holder, so its slanted lines were never quite straight. Laid next to each other, he said, such lines were strengthened by "the moiré effect that arises when you have several lines next to each other, especially if they do not have quite the same angle". He wrote a program that drew the cross many times, each time smaller and turned.2

Kallin went on to make computer pictures with the artist Sture Johannesson, among them the project INTRA.2, 3 Looking back in 2007 he said that what interested him was how lines "that are regular but not too regular" work together to make moiré-like patterns: "It has always amused me a lot."2 The story is told in full in the editorial Computer Art in Sweden. For drawing tone with many lines on a plotter, see line hatching and Plotter Art.

Sources

  1. “Moiré pattern”. Wikipedia
    French moiré, a textile with a rippled, “watered” look, historically silk; for two patterns of step p turned by α, spacing between pale lines D = (p/2) / sin(α/2), for small angles D ≈ p/α; steps p and p + δp: 2d = p²/δp + p; strain measurement, banknotes, halftone screen angles, descreen filters, cameras and television.
  2. Sten Kallin, interviewed by Anna Orrghen, 10 September 2007. Från matematikmaskin till IT, Tekniska museet, Stockholm
    The Red Cross for Astrid Sampe on the IBM 1130: the loose pen, the moiré effect when several lines lie side by side, “especially if they do not have quite the same angle”; lines “regular but not too regular” forming moiré-like patterns, “It has always amused me a lot.”
  3. Sture Johannesson and Ann-Charlotte Johannesson, interviewed by Anna Orrghen, 2 October 2007. Från matematikmaskin till IT, Tekniska museet, Stockholm
    Abstract: “During the seventies and the eighties Sture worked together with Sten Kallin from IBM as they used computer technology to develop the projects INTRA and EPICS.”
Published
JAEV Notes, October 2026.
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JAEV Notes, “Moiré patterns”, jaev.gallery/notes/moire-patterns/, 2026.
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